Operation properties of an elliptical beam optics

Operation properties of an optical system for elliptical beam generation is described in this report. The system is constructed by using commercially-available elements and consists of three parts of power variation, beam expander and elliptical beam formation. The power variation and elliptical beam formation are achieved by a computer-controlled system with high accuracy and repeatability. Experimental results of system characteristics showed that the focal line width at the focal point is the same as that of the diffraction limitation. The elliptical beam system can be applied to the laser dicing of the semiconductor wafer with a cutting width less than 20 μm.