Ion beam mixing of ZnO/SiO2 and Sb/Ni/Si interfaces under swift heavy ion irradiation

被引：0

作者：

Kraft, Saskia ^{[1
]}

Schattat, Beate ^{[1
]}

Bolse, Wolfgang ^{[1
]}

Klaumünzer, Siegfried ^{[2
]}

Harbsmeier, Felix ^{[3
]}

Kulinska, Agnieszka ^{[3
]}

Löffl, Anton ^{[4
]}

机构：

[1] Institut für Strahlenphysik, Universität Stuttgart, Allmandring 3, 70569 Stuttgart, Germany

[2] Hahn-Meitner-Institut, Glienicker Strasse 100, 14091 Berlin, Germany

[3] II. Physikalisches Institut, Universität Göttingen, Bunsenstraße 7, 37073 Göttingen, Germany

[4] Institut für Physikalische Elektronik, Universität Stuttgart, Pfaffenwaldring 53, 70569 Stuttgart, Germany

来源：

Journal of Applied Physics | 2002年 / 91卷 / 03期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1129 / 1134

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