Rhodium and Rhodium Oxide Thin Films Characterized by XPS

被引：68
|
作者：
Abe, Yoshio [1 ]
Kato, Kiyohiko [1 ]
Kawamura, Midori [1 ]
Sasaki, Katsutaka [1 ]
机构：
[1] Department of Materials Science, Kitami Institute of Technology, 165 Koen-cho, Kitami,090-8507, Japan
来源：
Surface Science Spectra | 2001年 / 8卷 / 02期
关键词：
D O I：
10.1116/11.20010801
中图分类号：
学科分类号：
摘要：
Rhodium compounds
引用
收藏
页码：117 / 125
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