Investigation of delta-doped pHEMT InGaAs/GaAs/AlGaAs structures by the electrochemical capacitance-voltage technique

被引:0
|
作者
Yakovlev, G. [1 ]
Frolov, D. [1 ]
Zubkov, V. [1 ]
机构
[1] Department of Micro- and Nanoelectronics, St. Petersburg Electrotechnical University LETI, Prof. Popov str. 5, St. Petersburg,197376, Russia
来源
Journal of Physics: Conference Series | 2016年 / 690卷 / 01期
关键词
701.1 Electricity: Basic Concepts and Phenomena - 712.1.1 Single Element Semiconducting Materials - 712.1.2 Compound Semiconducting Materials - 714.2 Semiconductor Devices and Integrated Circuits - 741.3 Optical Devices and Systems;
D O I
17th Russian Youth Conference on Physics of Semiconductors and Nanostructures, Opto- and Nanoelectronics, RYCPS 2015
中图分类号
学科分类号
摘要
9
引用
收藏
相关论文
共 50 条
  • [1] Investigation of delta-doped pHEMT InGaAs/GaAs/ALGaAs structures by the electrochemical capacitance-voltage technique
    Yakovlev, G.
    Frolov, D.
    Zubkov, V.
    [J]. 17TH RUSSIAN YOUTH CONFERENCE ON PHYSICS OF SEMICONDUCTORS AND NANOSTRUCTURES, OPTO- AND NANOELECTRONICS (RYCPS 2015), 2016, 690
  • [2] Electrochemical capacitance-voltage measurements and modeling of GaAs nanostructures with delta-doped layers
    Shestakova, L.
    Yakovlev, G.
    Zubkov, V.
    [J]. 18TH RUSSIAN YOUTH CONFERENCE ON PHYSICS OF SEMICONDUCTORS AND NANOSTRUCTURES, OPTO- AND NANOELECTRONICS, 2017, 816
  • [3] INFLUENCE OF THE DX CENTER ON THE CAPACITANCE-VOLTAGE CHARACTERISTICS OF DELTA-DOPED GAAS
    ZRENNER, A
    [J]. APPLIED PHYSICS LETTERS, 1989, 55 (02) : 156 - 158
  • [4] Influence of partial dopant ionization on the capacitance-voltage profiles of delta-doped structures
    Moon, CR
    Kwon, SD
    Lim, H
    Choe, BD
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (26) : 3491 - 3493
  • [5] OPTICAL AND TRANSPORT-PROPERTIES OF DELTA-DOPED PSEUDOMORPHIC ALGAAS/INGAAS/GAAS STRUCTURES
    SHEN, WZ
    TANG, WG
    SHEN, SC
    DIMOULAS, A
    [J]. INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES, 1994, 15 (11): : 1809 - 1818
  • [6] Simulation and analysis of the capacitance-voltage characteristics of the delta-doped semiconductors
    Liu, DG
    Lee, CP
    [J]. MATERIALS CHEMISTRY AND PHYSICS, 1997, 50 (03) : 200 - 204
  • [7] Characterization of periodically delta-doped semiconductors by capacitance-voltage profiling
    Goncalves, LCD
    Henriques, AB
    Souza, PL
    Yavich, B
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1997, 12 (11) : 1455 - 1458
  • [8] Estimation of AlGaAs/GaAs epitaxial structures thickness by means of electrochemical capacitance-voltage profiling
    Goncharov, V.E.
    Nikonov, A.V.
    Ilyasov, A.K.
    Arich, O.D.
    [J]. Applied Physics, 2019, 2019-January (03): : 61 - 66
  • [9] INTERPRETATION OF CAPACITANCE-VOLTAGE PROFILES FROM DELTA-DOPED GAAS GROWN BY MOLECULAR-BEAM EPITAXY
    SCHUBERT, EF
    PLOOG, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (07): : 966 - 970
  • [10] Design, processing and characterization of delta-doped channel AlGaAs/InGaAs/GaAs HFETs
    Nawaz, M
    Miranda, JM
    Sakalas, P
    Wang, SM
    Zhao, QX
    Willander, M
    Zirath, H
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2000, 15 (07) : 728 - 735