Modeling optical breakdown in dielectrics during ultrafast laser processing

被引：0
|
作者：
Fan, Ching-Hua [1 ]
Longtin, Jon P. [1 ]
机构：
[1] Department of Mechanical Engineering, Stt. Univ. New York at Stony Brook, Stony Brook, NY 11794-2300, United States
来源：
Applied Optics | 2001年 / 40卷 / 18期
关键词：
Optical breakdown;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：3124 / 3131
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