Evaluation of high-transmittance attenuated phase shifting mask for 157 nm lithography

被引：0
|
作者：
Yamabe, Osamu [1 ]
Watanabe, Kunio [1 ]
Itani, Toshiro [1 ]
机构：
[1] SLET, Inc., 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 6 B期
关键词：
D O I：
10.1143/jjap.41.4042
中图分类号：
学科分类号：
摘要：
9
引用
收藏
页码：4042 / 4045
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