Effect of additive CH3COONH4 on removal of NO and SO2 by dielectric barrier-corona discharge coupling method

被引:0
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作者
Kan, Qing [1 ]
Yang, Lan [1 ]
Liu, Lu [1 ]
Ma, Xiaoxun [1 ]
机构
[1] School of Chemical Engineering, Northwest University, International Scientific and Technological Cooperation Base for Clean Utilization of Hydrocarbon Resources, Xi'an,Shaanxi,710069, China
关键词
Dielectric barrier discharge - Dielectric devices - Dielectric materials - Electric corona - Plasma applications;
D O I
10.16085/j.issn.1000-6613.2019-0152
中图分类号
学科分类号
摘要
The removal of NO and SO2 in simulated flue gas was studied by self-designed dielectric barrier - corona discharge plasma reactor. The effects of gas composition such as O2 concentration, CO2 concentration and water vapor on the removal of NO and SO2 were investigated. The effect of additive CH3COONH4 on NO and SO2 removal and its mechanism of action were also discussed. Experimental results showed that the increase of O2 concentration, CO2 concentration and H2O vapor concentration would inhibit the removal of NO. After the introduction of CH3COONH4, these inhibitory effects would be weakened and the removal rate of NO would be greatly increased, but its inhibitory effects would not be completely eliminated. After the introduction of CH3COONH4 into N2/O2/SO2 system, the influence of gas composition and input current on SO2 removal was not obvious, and the removal rate of SO2 could reach about 94%. When 0.27%CH3COONH4 was added into N2/O2/CO2/H2O/NO/SO2 system, under the initial concentration of NO was constant, When the content of SO2 was low, the effect on NO removal was not obvious, the removal rate of NO decreased with the increase of SO2 concentration, the effect of SO2 could be eliminated by increasing the addition of CH3COONH4. On the other hand, under the condition of constant initial concentration of SO2, with the increase of NO content, the removal rate of SO2 remained around 94%. When 0.51%CH3COONH4 was added into N2/O2/CO2/H2O/NO/SO2 system, the removal rate of NO reached 72% when the input current was 2.5A. © 2019, Chemical Industry Press. All right reserved.
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页码:4786 / 4796
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