Joint adsorption of silicon and oxygen on heated (100) W

被引：0
|
作者：
Gall, N.R. [1 ]
Rut'kov, E.V. [1 ]
Tontegode, A.Ya. [1 ]
Plekhotkina, G.L. [2 ]
机构：
[1] A. F. Ioffe Phys.-Tech. Institute, Saint-Petersburg, Russia
[2] GUAP, Saint-Petersburg, Russia
来源：
Surface Investigation X-Ray, Synchrotron and Neutron Techniques | 2001年 / 16卷 / 10期
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页码：1543 / 1550
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