Joint adsorption of silicon and oxygen on heated (100) W

被引：0

作者：

Gall, N.R. ^{[1
]}

Rut'kov, E.V. ^{[1
]}

Tontegode, A.Ya. ^{[1
]}

Plekhotkina, G.L. ^{[2
]}

机构：

[1] A. F. Ioffe Phys.-Tech. Institute, Saint-Petersburg, Russia

[2] GUAP, Saint-Petersburg, Russia

来源：

Surface Investigation X-Ray, Synchrotron and Neutron Techniques | 2001年 / 16卷 / 10期

关键词：

Adatoms;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1543 / 1550

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