Investigation of the mechanism and model about Ni based ohmic contacts to n-type SiC

被引:0
|
作者
Guo, Hui [1 ,2 ]
Zhang, Yimen [1 ,2 ]
Zhang, Yuming [1 ,2 ]
Lu, Hongliang [1 ,2 ]
机构
[1] Microelectronic School, Xidian University, Xi'an 710071, China
[2] Key Lab. of Wide Band-gap Semiconductor Materials and Devices, Xi'an 710071, China
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:42 / 45
相关论文
共 50 条
  • [1] Ta/Ni/Ta multilayered ohmic contacts on n-type SiC
    Yang, H.
    Peng, T. H.
    Wang, W. J.
    Zhang, D. F.
    Chen, X. L.
    APPLIED SURFACE SCIENCE, 2007, 254 (02) : 527 - 531
  • [2] Si ohmic contacts on N-type SiC
    Cichon, Stanislav
    Machac, Petr
    Barda, Bohumil
    Kudrnova, Marie
    2011 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE AND MATERIALS FOR ADVANCED METALLIZATION (IITC/MAM), 2011,
  • [3] INVESTIGATION OF AU-NI OHMIC CONTACTS ON N-TYPE GAP
    FREMUNT, R
    KORTAN, J
    JANOUSKOVA, O
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1973, 6 (09) : L95 - L97
  • [4] On the Formation of Ni-based Ohmic Contacts to n-type 4H-SiC
    Kuchuk, A. V.
    Kladko, V. P.
    Piotrowska, A.
    Ratajczak, R.
    Jakiela, R.
    SILICON CARBIDE AND RELATED MATERIALS 2008, 2009, 615-617 : 573 - 576
  • [5] Investigation of Ta/Ni bilayered ohmic contacts on n-type SiC single-crystal substrate
    Ruifang Li
    Zhongnan Guo
    Jingjing Yang
    Xiaopeng Zeng
    Wenxia Yuan
    Monatshefte für Chemie - Chemical Monthly, 2012, 143 : 1329 - 1334
  • [6] Ni-Based Ohmic Contacts to n-Type 4H-SiC: The Formation Mechanism and Thermal Stability
    Kuchuk, A. V.
    Borowicz, P.
    Wzorek, M.
    Borysiewicz, M.
    Ratajczak, R.
    Golaszewska, K.
    Kaminska, E.
    Kladko, V.
    Piotrowska, A.
    ADVANCES IN CONDENSED MATTER PHYSICS, 2016, 2016
  • [7] Accurate calculation of the specific contact resistance for Ni based Ohmic Contacts to the N-type SiC
    Guo, Hui
    Zhang, Yi-Men
    Zhang, Yu-Ming
    Tang, Xiao-Yan
    Feng, Qian
    Xi'an Dianzi Keji Daxue Xuebao/Journal of Xidian University, 2008, 35 (05): : 842 - 845
  • [8] Investigation of Ta/Ni bilayered ohmic contacts on n-type SiC single-crystal substrate
    Li, Ruifang
    Guo, Zhongnan
    Yang, Jingjing
    Zeng, Xiaopeng
    Yuan, Wenxia
    MONATSHEFTE FUR CHEMIE, 2012, 143 (09): : 1329 - 1334
  • [9] Comparison of Ni/Ti and Ni ohmic contacts on n-type 6H-SiC
    Barda, Bohumil
    Machac, Petr
    Hubickova, Marie
    Nahlik, Josef
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2008, 19 (11) : 1039 - 1044
  • [10] Comparison of Ni/Ti and Ni ohmic contacts on n-type 6H–SiC
    Bohumil Barda
    Petr Macháč
    Marie Hubičková
    Josef Náhlík
    Journal of Materials Science: Materials in Electronics, 2008, 19 : 1039 - 1044