The influence of different precursor gases on the as-deposited a-C:F:H films

被引：0
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作者：
Xin, Yu
Ning, Zhao-Yuan
Cheng, Shan-Hua
Lu, Xin-Hua
Jiang, Mei-Fu
Xu, Sheng-Hua
Ye, Chao
Huang, Song
Du, Wei
机构：
[1] Department of Physics, Suzhou University, Prov. Key Lab. of Thin Film Mat., Suzhou 215006, China
[2] Department of Chemistry, Testing and Analysis Center, Suzhou University, Suzhou 215006, China
来源：
Wuli Xuebao/Acta Physica Sinica | 2002年 / 51卷 / 08期
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页码：1868 / 1869
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