Sub-1 nm MoS2 and WS2 with extremely enhanced performance

被引：0

作者：

Chen, Zhexue ^{[1
,2
]}

Wu, Xianxin ^{[2
,3
]}

Xiao, Liuyang ^{[1
,2
]}

Gao, Hanbin ^{[2
,3
]}

Li, Zhangqiang ^{[1
,2
]}

Zhou, Xuanping ^{[1
,2
]}

Li, Yueqi ^{[1
,2
]}

Guo, Ning ^{[2
,3
]}

Guo, Yanjun ^{[2
,3
]}

Qi, Xiaoying ^{[3
]}

Bai, Lu ^{[3
]}

Chang, Huaiqiu ^{[3
]}

Zheng, Qiang ^{[2
,3
]}

Liu, Xinfeng ^{[2
,3
]}

Zhang, Yong ^{[1
,2
]}

机构：

[1] CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing,100190, China

[2] University of Chinese Academy of Sciences, Beijing,100049, China

[3] CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing,100190, China

来源：

Nano Today | 2024年 / 54卷

基金：

中国国家自然科学基金;

关键词：

Ball milling - Layered semiconductors - Milling (machining) - Molybdenum disulfide - Silica - Tungsten compounds;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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