Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers

被引：0
|
作者：
Fischer, David Dustin [1 ]
Knaut, Martin [1 ]
Reif, Johanna [1 ]
Nehm, Frederik [2 ]
Albert, Matthias [1 ]
Bartha, Johann W. [1 ]
机构：
[1] Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden,01062, Germany
[2] Dresden Integrated Center for Applied Physics and Photonic Materials (IAPP), Institute for Applied Physics, Technische Universität Dresden, Dresden,01062, Germany
来源：
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 2020年 / 38卷 / 02期
关键词：
Capacitive coupled plasmas - Deposition temperatures - Electrical measurement - Fabrication temperature - Polyethylene naphthalate - Scanning electron microscopy image - Water vapor transmission rate - X ray photoemission spectroscopy;
D O I：
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学科分类号：
摘要：
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