Hydrogen permeation through uniaxially strained SiOx barrier thin films photochemically prepared on PET foil substrates

被引:2
|
作者
With, P. C. [1 ]
Proehl, T. [1 ]
Gerlach, J. W. [1 ]
Prager, A. [1 ]
Konrad, A. [2 ]
Arena, F. [2 ]
Helmstedt, U. [1 ]
机构
[1] Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany
[2] Mecadi GmbH, Kolling 145, D-66450 Bexbach, Germany
关键词
Hydrogen permeation; Gas barrier film; Photochemistry; Film elongation; Film stress; Photoconversion; IRRADIATION; DIFFUSION; MEMBRANES;
D O I
10.1016/j.ijhydene.2024.07.249
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Hydrogen permeation through uniaxially strained thin SiOx x based gas barrier films, formed at room temperature and ambient pressure on PET foil substrates by UV photochemical conversion (Photoconversion), was investigated using a dedicated measurement system. Hydrogen permeation measurements were conducted as a function of the stack of laminated single SiOx x barrier films, of the sample temperature as well as of the uniaxial mechanical strain applied to the samples. The results demonstrate a significant overall improvement of the hydrogen barrier properties for both single SiOx x barrier films on PET and laminated single SiOx x barrier films on PET. In the case of strained samples, the hydrogen barrier properties deteriorate due to stress-induced crack formation in the barrier films. This deterioration is strongest for strained single SiOx x barrier films but can be substantially reduced by laminating single SiOx x barrier films.
引用
收藏
页码:405 / 410
页数:6
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