机构:
Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Wong, Tai-Lun
[1
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Cai, Yuan
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Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Cai, Yuan
[1
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Chan, Siu-Keung
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Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Chan, Siu-Keung
[1
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Sou, Iam-Keong
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Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Sou, Iam-Keong
[1
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Wang, Ning
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Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Wang, Ning
[1
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机构:
[1] Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China
We report here the growth of ultra thin ZnSe nanowires at low temperatures by Au-catalyzed molecule beam epitaxy and structural characterization of the nanowires. ZnSe nanowires may contain a high density of stacking faults and twins from low temperature growth and show a phase change from cubic to hexagonal structures. Ultra thin ZnSe nanowires can grow at a temperature below the eutectic point, and the relationship between the growth rates and nanowire diameters is V= l/d(n) + C-0 (C-0 is a constant and n is a fitting parameter). The growth rate of the ultra thin nanowires at low temperatures can be elucidated based oil the model involving interface incorporation and diffusion, in which the catalyst is solidified, and the nanowire growth is controlled through the diffusion of atoms into the interface between the catalyst and nanowire. Tile growth rate of ZnSe ultra thin nanowires has been simulated.
机构:
Chung Ang Univ, Inst Technol & Sci, Dept Elect Engn, Semicond Proc & Device Lab,DongJak Ku, Seoul 156756, South KoreaChung Ang Univ, Inst Technol & Sci, Dept Elect Engn, Semicond Proc & Device Lab,DongJak Ku, Seoul 156756, South Korea