Alignable Ferromagnetic Shadow Mask for Photolithography Replacement

In this study, we introduce a method for fabricating microscale patterns via the alignment of ferromagnetic shadow masks (FSMs), which ensures uniform attachment of the patterns to a substrate while minimizing blurring effects. This technique involves the precise alignment of FSMs using a mask aligner and vacuum tweezers, which facilitates the fabrication of high-resolution patterns. Experimental results indicate that the alignment error remains below 6 (sic) both before and after the reactive-ion etching process, thus demonstrating a precision level similar to that of a mask aligner but with a slightly larger range. The findings of this study demonstrate the effectiveness of FSMs as an alternative to photolithography in the MEMS fabrication process and suggest their potential applicability in the manufacture of microscale devices.