Promoting solution-processed CdTe nanocrystal solar cells via rationally controlled copper doping

被引:0
|
作者
Huang, Qichuan [1 ]
Liu, Songwei [1 ]
Min, Chenbo [1 ]
Zhou, Zheng [1 ]
Qin, Donghuan [1 ,3 ]
Wang, Dan [1 ,3 ]
Xu, Wei [1 ,3 ]
Hou, Lintao [2 ]
机构
[1] South China Univ Technol, Sch Mat Sci & Engn, Guangzhou 510640, Peoples R China
[2] Jinan Univ, Guangdong Prov Key Lab Opt Fiber Sensing & Commun, Guangzhou Key Lab Vacuum Coating Technol & New Ene, Siyuan Lab,Dept Phys,Dept Phys, Guangzhou 510632, Peoples R China
[3] South China Univ Technol, Inst Polymer Optoelect Mat & Devices, State Key Lab Luminescent Mat & Devices, Guangzhou 510640, Peoples R China
基金
美国国家科学基金会; 中国国家自然科学基金;
关键词
BAND ALIGNMENT; ENERGY; FILM; MIGRATION; OXIDE;
D O I
10.1039/d4tc02669a
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The back contact of p-type semiconductors and metal electrodes have always been a difficulty in fabricating photovoltaics with high performance. The incompatibility of high HOMO with a metal work function may lead to Schottky contact at a back semiconductor-metal interface and lead to device inversion. Thus, the performance of the photovoltaic is restricted, especially for solution-processed CdTe NC solar cells. In our research, we proposed using Cu salts as a Cu source to dope CdTe NCs and improve the back contact interface. Enhanced performance in solution-processed NC solar cells is achieved by introducing an engineered Cu salt layer (CuCl2 and CuBr2). Exceptional performance is attained with the optimized CdTe NC doped with CuCl2, exhibiting a high short-circuit current of 20.20 mA cm(-2), an open-circuit voltage of 0.58 V, and a fill factor of 53.74%, resulting in a power conversion efficiency of 6.3%. These results represent a significant improvement over the control group. Through detailed first principles studies and experimental verification, we demonstrate that the copper halide-doped CdTe NC thin film is promising to promote the carrier concentration of the CdTe NC and suppress carrier recombination by improving band alignment at the back contact interface.
引用
收藏
页码:14283 / 14292
页数:10
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