Influence of Potential and the Presence of Boric Acid on Pt1-xCox Alloy Electrodeposition and Magnetic Properties

被引:0
|
作者
Rus, Eric D. [1 ]
Correa, Eduardo L. [1 ,2 ]
Dennis, Cindi L. [1 ]
Moffat, Thomas P. [1 ]
机构
[1] NIST, Mat Sci & Engn Div, Mat Measurement Lab, Gaithersburg, MD 20899 USA
[2] Theiss Res, La Jolla, CA USA
关键词
platinum cobalt; magnetic thermosensitivity; Curie temperature; co-deposition; X-ray diffraction; voltammetry; Coulombic efficiency; PT-CO; X-RAY; COBALT; FILMS; FE; PLATINUM; PH; REDUCTION; ANIONS; GROWTH;
D O I
10.1149/1945-7111/ad6b48
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The effects of potential and the presence of B(OH)(3) on Pt1-xCox alloy electrodeposition from aqueous chloride-based solutions on Ru substrates was investigated. Films deposited at potentials more reducing than -0.65 V vs SCE were hexagonal close packed and greater than 90% Co (mole basis), and films deposited at potentials more oxidizing than -0.65 V were face centered cubic and showed a monotonic decrease in cobalt content as the potential increased. The composition and structure-potential dependences were not strongly affected by the presence of B(OH)(3). Structural change coincided with a distinct knee-like feature in the composition-potential relationship, along with a prominent narrow voltammetric peak associated with Co deposition, possibly related to nucleation and growth of the hcp phase. The presence of B(OH)(3) produced a sharp minimum in both Coulombic efficiency and deposition rate at potentials near -0.65 V and almost entirely suppressed the voltammetric feature. This may be associated with a combination of B(OH)(3)-derived proton reduction and inhibition of metal deposition by adsorbed B(OH)(3) or B(OH)(3)-derived species. The presence of B(OH)(3) affected the magnetic behavior of films deposited at potentials more oxidizing than -0.55 V (i.e., those with compositions less than about 40% Co) only weakly, but resulted in generally smaller maximum magnetizations for films deposited at more reducing potentials, and notably a much lower magnetization for films deposited at -0.65 V.
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页数:12
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