Degradation Mechanism and Stability of Flexible Self-Aligned Top-Gate InGaZnO TFT

被引:0
|
作者
Peng, Cong [1 ]
Xu, Meng [1 ]
Chen, Longlong [1 ]
Li, Xifeng [1 ]
Zhang, Jianhua [1 ]
机构
[1] Shanghai Univ, Shanghai Collaborat Innovat Ctr Intelligent Sensin, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China
基金
中国国家自然科学基金;
关键词
Bending; Stress; Thin film transistors; Logic gates; Lighting; Degradation; Thermal stability; indium gallium zinc oxide; negative bias illumination stability; self-aligned top gate; THIN-FILM TRANSISTORS; A-IGZO TFTS; STRESS; PERFORMANCE; ILLUMINATION; RECOVERY;
D O I
10.1109/TED.2024.3462368
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article, the prepared flexible self-aligned top-gate (SATG) In-Ga-Zn-O (IGZO) thin-film transistors (TFTs) have mobility of 14.09 cm(2)& sdot; V-1 & sdot; s(-1) and negative bias illumination stress (NBIS) less than - 0.18 V. The bending radius is reduced from infinity to 5 mm with almost no change in subthreshold swing (SS), maintaining a good performance of 0.13 V & sdot; dec(-1). However, the device performance gradually degrades as the bend radius is further reduced and the bend angle is decreased. The analysis results indicate that the main reason for this phenomenon is the increase of donor-like states and acceptor-like states in the Gaussian distribution.
引用
收藏
页码:7503 / 7508
页数:6
相关论文
共 50 条
  • [11] Self-aligned top-gate InGaZnO thin film transistors using SiO2/Al2O3 stack gate dielectric
    Chen, Rongsheng
    Zhou, Wei
    Zhang, Meng
    Wong, Man
    Kwok, Hoi Sing
    THIN SOLID FILMS, 2013, 548 : 572 - 575
  • [12] Submicrometer Top-Gate Self-Aligned a-IGZO TFTs by Substrate Conformal Imprint Lithography
    Ram, Mamidala Saketh
    de Kort, Laura
    de Riet, Joris
    Verbeek, Roy
    Bel, Thijs
    Gelinck, Gerwin
    Kronemeijer, Auke Jisk
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (04) : 1778 - 1782
  • [13] High performance amorphous oxide thin film transistors with self-aligned top-gate structure
    Park, Jae Chul
    Kim, Sang Wook
    Kim, Sun Il
    Yin, Huaxiang
    Hur, Ji Hyun
    Jeon, Sang Hun
    Park, Sung Ho
    Song, I. Hun
    Park, Young Soo
    Chung, U. In
    Ryu, Myung Kwan
    Lee, Sangwon
    Kim, Sungchul
    Jeon, Yongwoo
    Kim, Dong Myong
    Kim, Dae Hwan
    Kwon, Kee-Won
    Kim, Chang Jung
    2009 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, 2009, : 174 - +
  • [14] Self-aligned Top-gate ZnO TFTs with Sputtered Al2O3 Gate Dielectric
    Chen, R.
    Zhou, W.
    Zhao, S.
    Zhang, M.
    Kwok, H. S.
    PROCEEDINGS OF CHINA DISPLAY/ASIA DISPLAY 2011, 2011, : 586 - 588
  • [15] Self-aligned top-gate amorphous gallium indium zinc oxide thin film transistors
    Park, Jaechul
    Song, Ihun
    Kim, Sunil
    Kim, Sangwook
    Kim, Changjung
    Lee, Jaecheol
    Lee, Hyungik
    Lee, Eunha
    Yin, Huaxiang
    Kim, Kyoung-Kok
    Kwon, Kee-Won
    Park, Youngsoo
    APPLIED PHYSICS LETTERS, 2008, 93 (05)
  • [16] Dual-gate self-aligned a-InGaZnO transistor model for flexible circuit applications
    De Roose, Florian
    Celiker, Hikmet
    Genoe, Jan
    Dehaene, Wim
    Myny, Kris
    2019 DESIGN, AUTOMATION & TEST IN EUROPE CONFERENCE & EXHIBITION (DATE), 2019, : 25 - 29
  • [17] Study on the Lateral Carrier Diffusion and Source-Drain Series Resistance in Self-Aligned Top-Gate Coplanar InGaZnO Thin-Film Transistors
    Hong, Sae-Young
    Kim, Hee-Joong
    Kim, Dae-Hwan
    Jeong, Ha-Yun
    Song, Sang-Hun
    Cho, In-Tak
    Noh, Jiyong
    Yun, Pil Sang
    Lee, Seok-Woo
    Park, Kwon-Shik
    Yoon, SooYoung
    Kang, In Byeong
    Kwon, Hyuck-In
    SCIENTIFIC REPORTS, 2019, 9 (1)
  • [18] Study on the Lateral Carrier Diffusion and Source-Drain Series Resistance in Self-Aligned Top-Gate Coplanar InGaZnO Thin-Film Transistors
    Sae-Young Hong
    Hee-Joong Kim
    Dae-Hwan Kim
    Ha-Yun Jeong
    Sang-Hun Song
    In-Tak Cho
    Jiyong Noh
    Pil Sang Yun
    Seok-Woo Lee
    Kwon-Shik Park
    SooYoung Yoon
    In Byeong Kang
    Hyuck-In Kwon
    Scientific Reports, 9
  • [19] Comparison of N2 and Ar plasma treatment for source/drain formation in self-aligned top-gate amorphous InGaZnO thin film transistor
    Lu, Hongjuan
    Ren, Chongyang
    Xiao, Xiang
    Xiao, Yuxiang
    Wang, Cuicui
    Zhang, Shengdong
    2016 23RD INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD), 2016, : 131 - 134
  • [20] A self-aligned double-gate polysilicon TFT technology
    Zhang, SD
    Han, R
    Sin, JKO
    Chan, MS
    2001 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, PROCEEDINGS, 2001, : 395 - 398