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Degradation Mechanism and Stability of Flexible Self-Aligned Top-Gate InGaZnO TFT
被引:0
|作者:
Peng, Cong
[1
]
Xu, Meng
[1
]
Chen, Longlong
[1
]
Li, Xifeng
[1
]
Zhang, Jianhua
[1
]
机构:
[1] Shanghai Univ, Shanghai Collaborat Innovat Ctr Intelligent Sensin, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Bending;
Stress;
Thin film transistors;
Logic gates;
Lighting;
Degradation;
Thermal stability;
indium gallium zinc oxide;
negative bias illumination stability;
self-aligned top gate;
THIN-FILM TRANSISTORS;
A-IGZO TFTS;
STRESS;
PERFORMANCE;
ILLUMINATION;
RECOVERY;
D O I:
10.1109/TED.2024.3462368
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
In this article, the prepared flexible self-aligned top-gate (SATG) In-Ga-Zn-O (IGZO) thin-film transistors (TFTs) have mobility of 14.09 cm(2)& sdot; V-1 & sdot; s(-1) and negative bias illumination stress (NBIS) less than - 0.18 V. The bending radius is reduced from infinity to 5 mm with almost no change in subthreshold swing (SS), maintaining a good performance of 0.13 V & sdot; dec(-1). However, the device performance gradually degrades as the bend radius is further reduced and the bend angle is decreased. The analysis results indicate that the main reason for this phenomenon is the increase of donor-like states and acceptor-like states in the Gaussian distribution.
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页码:7503 / 7508
页数:6
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