Investigation of projectile fragment emission in the fragmentation of 28Si on C target at 736 A MeV

被引:0
|
作者
Dang, Ying-Hua [1 ,2 ]
Li, Jun-Sheng [1 ]
Zhang, Dong-Hai [1 ]
Xi, Ya-Ting [3 ]
Kodaira, Satoshi [4 ]
Yasuda, Nakahiro [5 ]
机构
[1] Shanxi Normal Univ, Inst Modern Phys, Taiyuan 030031, Peoples R China
[2] Shanxi Univ Elect Sci & Technol, Linfen 041000, Peoples R China
[3] China Inst Radiat Protect, Taiyuan 030006, Peoples R China
[4] Natl Inst Quantum & Radiol Sci & Technol, Radiat Measurement & Dose Assessment, 4-9-1 Anagawa,Inage Ku, Chiba 2638555, Japan
[5] Univ Fukui, Res Inst Nucl Engn, Fukui 9140055, Japan
来源
关键词
Projectile fragmentation; angular distribution; transverse momentum distribution; temperature; CR-39; CROSS-SECTIONS; RELATIVISTIC NUCLEI; CR-39; DETECTOR; TOTAL CHARGE; CH2; TARGETS; SI14+ IONS; POLYETHYLENE; CARBON; AL; TEMPERATURE;
D O I
10.1142/S0218301324500307
中图分类号
O57 [原子核物理学、高能物理学];
学科分类号
070202 ;
摘要
The emission angular distributions, the transverse momentum distributions and the temperature parameters of projectile fragments produced in fragmentation of Si-28 on C target at 736AMeV are measured. It is found that the scattering angle of primary silicon ions is smaller than the emission angle of their fragments. The average value and the width of the angular distribution and the transverse momentum distribution are increased with the decrease of the charge of projectile fragments. The cumulative squared transverse momentum distribution of projectile fragments can be well fitted by a single Rayleigh distribution, which indicates that the projectile fragments are emitted from a single temperature emission source. Most of the temperature parameters of projectile fragments emission source are in the range of 2-5MeV, which does not obviously depend on the charge of the projectile fragments.
引用
收藏
页数:15
相关论文
共 50 条
  • [31] Photoluminescence study of GaAs implanted with 100 MeV 28Si ions
    Ali, Y. P.
    Narsale, A. M.
    Arora, B. M.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 247 (02): : 238 - 243
  • [32] The 6Li exclusive breakup on 28Si at 13 MeV
    Pakou, A
    Alamanos, N
    Clarke, NM
    Davis, NJ
    Doukelis, G
    Kalyva, G
    Kokkoris, M
    Lagoyannis, A
    Mertzimekis, TJ
    Musumarra, A
    Nicolis, NG
    Papachristodoulou, C
    Patronis, N
    Perdikakis, G
    Pierroutsakou, D
    Roubos, D
    Rusek, K
    Spyrou, S
    Zarkadas, C
    PHYSICS LETTERS B, 2006, 633 (06) : 691 - 695
  • [33] ELASTIC AND INELASTIC SCATTERING OF 14.7 MEV NEUTRONS FROM 28SI
    HOHN, J
    POSE, H
    SEELIGER, D
    NUCLEAR PHYSICS A, 1969, A134 (02) : 289 - &
  • [34] Projectile fragment emission in the fragmentation of 56Fe on Al,C,and CH2 targets
    Luo-Huan Wang
    Liang-Di Huo
    Jia-Huan Zhu
    Hai-Rui Duan
    Jing-Ya Wu
    Hui-Ling Li
    Jun-Sheng Li
    S.Kodaira
    N.Yasuda
    Dong-Hai Zhang
    NuclearScienceandTechniques, 2019, 30 (12) : 87 - 97
  • [35] Projectile fragment emission in the fragmentation of 56Fe on Al, C, and CH2 targets
    Wang, Luo-Huan
    Huo, Liang-Di
    Zhu, Jia-Huan
    Duan, Hai-Rui
    Wu, Jing-Ya
    Li, Hui-Ling
    Li, Jun-Sheng
    Kodaira, S.
    Yasuda, N.
    Zhang, Dong-Hai
    NUCLEAR SCIENCE AND TECHNIQUES, 2019, 30 (12)
  • [36] FLUTTUAZIONI NELLA SEZIONE DURTO DELLE REAZIONI 28SI(GAMMA P) E 28SI(GAMMA ALPHA) INTORNO A EGAMMA=17.64 MEV
    BIZZETI, PG
    SONA, AMB
    BOCCIOLI.M
    DICAPORI.G
    FAZZINI, T
    MANDO, M
    NUOVO CIMENTO, 1964, 2 (04): : 677 - +
  • [37] 936 AND 1261 KEV RESONANCES IN 27AL(P, GAMMA)28SI REACTION AND PROPERTIES OF 6.88 MEV DOUBLET STATE IN 28SI
    NORDHAGEN, R
    NUCLEAR PHYSICS, 1963, 44 (01): : 130 - &
  • [38] EXCITED LEVELS OF 28SI INVESTIGATED BY INELASTIC SCATTERING OF 185 MEV PROTONS
    SUNDBERG, O
    JOHANSSO.A
    TIBELL, G
    DAHLGREN, S
    HASSELGR.D
    HOISTAD, B
    INGEMARS.A
    RENBERG, PU
    NUCLEAR PHYSICS A, 1967, A101 (03) : 481 - +
  • [39] Annealing effects on electrical characteristics of 100 MeV 28Si implantation in GaAs
    A. M. Narsale
    A. R. Damle
    Yousuf P. Ali
    D. Kanjilal
    B. M. Arora
    A. P. Shah
    S. G. Lokhre
    V. P. Salvi
    Journal of Materials Science: Materials in Electronics, 2000, 11 : 439 - 443
  • [40] Annealing effects on electrical characteristics of 100 MeV 28Si implantation in GaAs
    Narsale, AM
    Damle, AR
    Ali, YP
    Kanjilal, D
    Arora, BM
    Shah, AP
    Lokhre, SG
    Salvi, VP
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2000, 11 (05) : 439 - 443