Topological Surface State Evolution in Bi2Se3 via Surface Etching

被引:0
|
作者
Yue, Ziqin [1 ,2 ]
Huang, Jianwei [1 ]
Wang, Ruohan [1 ]
Li, Jia-Wan [3 ]
Rong, Hongtao [4 ]
Guo, Yucheng [1 ]
Wu, Han [1 ]
Zhang, Yichen [1 ]
Kono, Junichiro [1 ,5 ,6 ]
Zhou, Xingjiang [4 ]
Hou, Yusheng [3 ]
Wu, Ruqian [7 ]
Yi, Ming [1 ]
机构
[1] Rice Univ, Dept Phys & Astron, Houston, TX 77005 USA
[2] Rice Univ, Smalley Curl Inst, Appl Phys Grad Program, Houston, TX 77005 USA
[3] Sun Yat Sen Univ, Ctr Neutron Sci & Technol, Sch Phys, Guangdong Prov Key Lab Magnetoelect Phys & Devices, Guangzhou 510275, Peoples R China
[4] Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
[5] Rice Univ, Dept Elect & Comp Engn, Houston, TX 77005 USA
[6] Rice Univ, Dept Mat Sci & NanoEngn, Houston, TX 77005 USA
[7] Univ Calif Irvine, Dept Phys & Astron, Irvine, CA 92697 USA
基金
中国国家自然科学基金;
关键词
Topological insulator; Bi2Se3; ARPES; in situ etching; surface modification; SINGLE DIRAC CONE; INSULATOR BI2SE3;
D O I
10.1021/acs.nanolett.4c02846
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Topological insulators are materials that have an insulating bulk interior while maintaining gapless boundary states against back scattering. Bi2Se3 is a prototypical topological insulator with a Dirac-cone surface state around Gamma. Here, we present a controlled methodology to gradually remove Se atoms from the surface Se-Bi-Se-Bi-Se quintuple layers, eventually forming bilayer-Bi on top of the quintuple bulk. Our method allows us to track the topological surface state and confirm its robustness throughout the surface modification. Importantly, we report a relocation of the topological Dirac cone in both real space and momentum space as the top surface layer transitions from quintuple Se-Bi-Se-Bi-Se to bilayer-Bi. Additionally, charge transfer among the different surface layers is identified. Our study provides a precise method to manipulate surface configurations, allowing for the fine-tuning of the topological surface states in Bi2Se3, which represents a significant advancement toward nanoengineering of topological states.
引用
收藏
页码:12413 / 12419
页数:7
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