Hydrogen absorption boosting in mildly annealed bulk MoS2

被引:1
|
作者
Obando-Guevara, Jairo [1 ,2 ]
Gonzalez-Garcia, Alvaro [1 ]
Rosmus, Marcin [3 ]
Olszowska, Natalia [3 ]
Gonzalez, Cesar [1 ,4 ]
Moron-Navarrete, Guillermo [1 ]
Fujii, Jun [5 ]
Tejeda, Antonio [2 ]
Gonzalez-Barrio, Miguel angel [1 ]
Mascaraque, Arantzazu [1 ]
机构
[1] Univ Complutense Madrid, Dto Fis Mat, Madrid 28040, Spain
[2] Univ Paris Saclay, Lab Phys Solides, CNRS, F-91405 Orsay, France
[3] Jagiellonian Univ, Natl Synchrotron Radiat Ctr SOLARIS, Czerwone Maki 98, PL-30392 Krakow, Poland
[4] Inst Magnetismo Aplicado UCM ADIF, E-28232 Las Rozas De Madrid, Spain
[5] Ist Officina Mat IOM CNR, Lab TASC, I-34149 Trieste, Italy
关键词
All Open Access; Hybrid Gold;
D O I
10.1039/d4ta02570a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The basal plane of MoS2 has been considered a potential source of active catalytic sites in hydrogen absorption. Sulfur vacancies can activate the inert basal plane of MoS2; however, achieving sufficient catalytic efficiency requires a high defect concentration of about 12%. We investigated the effect of defects on the hydrogen adsorption on the basal plane of MoS2 using angle-resolved photoemission spectroscopy (ARPES) and density functional theory (DFT) calculations. Mild annealing in terms of temperature and time effectively introduces single sulfur vacancy (V-S) defects, as observed from the electronic structural changes that are in excellent agreement with DFT calculations for a V-S concentration of similar to 4%. Subsequent exposure to molecular hydrogen showed that the higher hydrogen pressure facilitates hydrogen adsorption, as predicted by theoretical calculations. Interestingly, hydrogen exposure restores the electronic structure to a state similar to that of pristine MoS2. These results suggest that the controlled introduction of V-S defects via annealing is a promising strategy for enhancing hydrogen adsorption on MoS2, paving the way for its potential use in future catalytic applications.
引用
收藏
页码:24694 / 24701
页数:8
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