All-optical nanoscale thermometry with silicon carbide color centers

被引:0
|
作者
Liu, Chengying [1 ]
Hu, Haibo [1 ,2 ]
Iu, Zhengtong [2 ]
Xiao, Shumin [1 ,2 ]
Wang, Junfeng [5 ]
Zhou, Yu [1 ,3 ]
Song, Qinghai [1 ,3 ,4 ]
机构
[1] Harbin Inst Technol, Minist Ind & Informat Technol, Key Lab Micronano Optoelect Informat Syst, Guangdong Prov Key Lab Semicond Optoelect Mat & In, Shenzhen 518055, Peoples R China
[2] Pengcheng Lab, Shenzhen 518055, Peoples R China
[3] Shenzhen Hong Kong Int Sci & Technol Pk, Quantum Sci Ctr Guangdong Hong Kong Macao Greater, Hong Kong 518045, Peoples R China
[4] Shanxi Univ, Collaborat Innovat Ctr Extreme Opt, Taiyuan 030006, Peoples R China
[5] Sichuan Univ, Coll Phys, Chengdu 610065, Peoples R China
基金
中国国家自然科学基金;
关键词
Compendex;
D O I
10.1364/PRJ.525971
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
All-optical thermometry plays a crucial role in precision temperature measurement across diverse fields. Quantum defects in solids are one of the most promising sensors due to their excellent sensitivity, stability, and biocompatibility. Yet, it faces limitations, such as the microwave heating effect and the complexity of spectral analysis. Addressing these challenges, we introduce a novel approach to nanoscale optical thermometry using quantum defects in silicon carbide (SiC), a material compatible with complementary metal-oxide-semiconductor (CMOS) processes. This method leverages the intensity ratio between anti-Stokes and Stokes emissions from SiC color centers, overcoming the drawbacks of traditional techniques such as optically detected magnetic resonance (ODMR) and zero-phonon line (ZPL) analysis. Our technique provides a real-time, highly sensitive (1.06% K-1), and diffraction-limited temperature sensing protocol, which potentially helps enhance thermal management in the future miniaturization of electronic components. (c) 2024 Chinese Laser Press
引用
收藏
页码:1696 / 1702
页数:7
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