Transferable Optical Enhancement Nanostructures by Gapless Stencil Lithography

被引:0
|
作者
Demir, Ahmet Kemal [1 ]
Li, Jiaruo [1 ]
Zhang, Tianyi [2 ]
Occhialini, Connor A. [1 ]
Nessi, Luca [1 ]
Song, Qian [1 ,3 ]
Kong, Jing [2 ]
Comin, Riccardo [1 ]
机构
[1] MIT, Dept Phys, Cambridge, MA 02139 USA
[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
关键词
Raman Spectroscopy; Plasmonics; Nanolithography; SERS; van der Waals Materials; RAMAN-SPECTROSCOPY; SPONTANEOUS EMISSION; SCATTERING; FERROMAGNETISM; GRAPHENE; DEFECTS; LAYERS;
D O I
10.1021/acs.nanolett.4c02148
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Optical spectroscopy techniques are central for the characterization of two-dimensional (2D) quantum materials. However, the reduced volume of atomically thin samples often results in a cross section that is far too low for conventional optical methods to produce measurable signals. In this work, we developed a scheme based on the stencil lithography technique to fabricate transferable optical enhancement nanostructures for Raman and photoluminescence spectroscopy. Equipped with this new nanofabrication technique, we designed and fabricated plasmonic nanostructures to tailor the interaction of few-layer materials with light. We demonstrate orders-of-magnitude increase in the Raman intensity of ultrathin flakes of 2D semiconductors and magnets as well as selective Purcell enhancement of quenched excitons in WSe2/MoS2 heterostructures. We provide evidence that the method is particularly effective for air-sensitive materials, as the transfer can be performed in situ. The fabrication technique can be generalized to enable a high degree of flexibility for functional photonic devices.
引用
收藏
页码:9882 / 9888
页数:7
相关论文
共 50 条
  • [1] 3D nanostructures fabricated by advanced stencil lithography
    Yesilkoy, F.
    Flauraud, V.
    Rueegg, M.
    Kim, B. J.
    Brugger, J.
    NANOSCALE, 2016, 8 (09) : 4945 - 4950
  • [2] Analysis of the blurring in stencil lithography
    Vazquez-Mena, O.
    Villanueva, L. G.
    Savu, V.
    Sidler, K.
    Langlet, P.
    Brugger, J.
    NANOTECHNOLOGY, 2009, 20 (41)
  • [3] DEPTH OF FOCUS ENHANCEMENT IN OPTICAL LITHOGRAPHY
    VONBUNAU, R
    OWEN, G
    PEASE, RFW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 3047 - 3054
  • [4] Resolution enhancement techniques for optical lithography
    Poornima, P
    Tripathy, SK
    Rao, R
    Sharma, D
    PROCEEDINGS OF THE ELEVENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOL 1 & 2, 2002, 4746 : 1260 - 1262
  • [5] Resistless nanofabrication by stencil lithography: A review
    Vazquez-Mena, O.
    Gross, L.
    Xie, S.
    Villanueva, L. G.
    Brugger, J.
    MICROELECTRONIC ENGINEERING, 2015, 132 : 236 - 254
  • [6] Stencil lithography for bridging MEMS and NEMS
    Ali, Basit
    Karimzadehkhouei, Mehrdad
    Esfahani, Mohammad Nasr
    Leblebici, Yusuf
    Alaca, B. Erdem
    MICRO AND NANO ENGINEERING, 2023, 19
  • [7] Resonant metamaterials for contrast enhancement in optical lithography
    Dobmann, Sabine
    Shyroki, Dzmitry
    Banzer, Peter
    Erdmann, Andreas
    Peschel, Ulf
    OPTICS EXPRESS, 2012, 20 (18): : 19928 - 19935
  • [8] CONTRAST ENHANCEMENT TECHNIQUES FOR SUBMICRON OPTICAL LITHOGRAPHY
    MACK, CA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 1428 - 1431
  • [9] Resolution enhancement techniques for optical lithography and optical imaging theory
    Shibuya, M
    OPTICAL REVIEW, 1997, 4 (1B) : 151 - 160
  • [10] Resolution enhancement techniques for optical lithography and optical imaging theory
    Masato Shibuya
    Optical Review, 1997, 4