Nanometer-scale electron beam shaping with thickness controlled and stacked nanostructured graphite

被引:1
|
作者
Haas, Jonas [1 ,2 ]
Rieger, Nils [1 ,2 ]
Schlegel, Michael [1 ,2 ]
Strobel, Kevin [1 ,2 ]
Meyer, Jannik C. [1 ,2 ]
机构
[1] Eberhard Karls Univ Tuebingen, Inst Appl Phys, Morgenstelle 10, D-72076 Tubingen, Germany
[2] Univ Tubingen, NMI Nat & Med Sci Inst, Markwiesenstr 55, D-72770 Reutlingen, Germany
关键词
VORTEX BEAMS; PHASE PLATE; GENERATION; MICROSCOPY; CONTRAST;
D O I
10.1063/5.0213057
中图分类号
O59 [应用物理学];
学科分类号
摘要
The generation of small electron probes is the basis for various techniques in which such a probe is scanned across a sample, and special probe shapes like vortices can be desirable, e.g., to gain insight into magnetic properties. Micron-scale phase plates or holographic masks, in combination with demagnifying optics, are usually used for creating such special probe wave functions. Here, we present the fabrication of nanometer-sized phase plates based on thickness-selected and stacked graphite layers as well as an analysis of their performance. First, a spiral phase plate is demonstrated that creates a vortex beam with an orbital angular momentum of 1 and an outer radius of 2.5 nm. Second, a three-level Fresnel lens built from two nanopatterned graphite membranes is presented, which achieves a focal spot with a full width at half maximum of 5.5 nm. Third, an array of electron sieves is demonstrated, each of which creates a focal spot with a radius of 2 nm, and the array is applied as a Shack-Hartmann wavefront detector. These elements allow the generation of few-nanometer sized focused probes or vortices without the need for additional optical elements.
引用
收藏
页数:7
相关论文
共 50 条
  • [41] Nanometer-scale resolution of a chloromethylated calixarene negative resist in electron-beam lithography: Dependence on the number of phenolic residues
    Sakamoto, T
    Manako, S
    Fujita, J
    Ochiai, Y
    Baba, T
    Yamamoto, H
    Teshima, T
    APPLIED PHYSICS LETTERS, 2000, 77 (02) : 301 - 303
  • [42] HARDNESS DEMONSTRATION OF DIAMOND TIPS BY NANOMETER-SCALE CONTROLLED SCRATCHING ON METALLIC SURFACES
    CHU, X
    MA, Z
    LIU, N
    CHANG, ZP
    HU, TM
    XUE, ZQ
    PANG, SJ
    APPLIED PHYSICS LETTERS, 1993, 63 (25) : 3446 - 3448
  • [43] SINGLE ELECTRON SWITCHING EVENTS IN NANOMETER-SCALE SI MOSFET'S.
    Howard, Richard E.
    Skocpol, William J.
    Jackel, Lawrence D.
    Mankiewich, Paul M.
    Fetter, Linus A.
    Tennant, Donald M.
    Epworth, Roger
    Ralls, Kristan S.
    IEEE Transactions on Electron Devices, 1985, ED-32 (09) : 1669 - 1674
  • [44] Spin-polarized electron transport through nanometer-scale Al grains
    Zhang, LY
    Wang, CY
    Wei, YG
    Liu, XY
    Davidovic, D
    PHYSICAL REVIEW B, 2005, 72 (15)
  • [46] Molecular beam epitaxial growth of InSb, GaSb, and AlSb nanometer-scale dots on GaAs
    Bennett, BR
    Magno, R
    Shanabrook, BV
    APPLIED PHYSICS LETTERS, 1996, 68 (04) : 505 - 507
  • [47] Nanometer-scale local structural study of the paraelectric cubic phase of KNbO3 by convergent-beam electron diffraction
    Tsuda, Kenji
    Tanaka, Michiyoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2017, 56 (10)
  • [48] Nanometer-scale pattern formation of GaAs by in situ electron-beam lithography using surface oxide layer as a resist film
    Ishikawa, T
    Tanaka, N
    Lopez, M
    Matsuyama, I
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2777 - 2780
  • [49] Nanometer-scale pattern formation of gaas by in situ electron-beam lithography using surface oxide layer as a resist film
    Optoelectronics Technology Research Laboratory, 5-5 Tohkodai, Tsukuba, Ibaraki
    300-26, Japan
    J Vac Sci Technol B Microelectron Nanometer Struct, 6 (2777-2780):
  • [50] Alternating-current induced thermal fatigue of gold interconnects with nanometer-scale thickness and width
    Sun, Lijuan
    Ling, Xue
    Li, Xide
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2011, 82 (10):