The Value of In-Line Metrology for Advanced Process Control

被引：0

作者：

Lee, Jaeho ^{[1
]}

Kim, Mike Young-Han ^{[2
,3
]}

Eun, Yongsoon ^{[1
]}

机构：

[1] DGIST, EECS, Daegu, South Korea

[2] Univ Calif San Diego, La Jolla, CA 92093 USA

[3] Gauss Labs Inc, Palo Alto, CA USA

来源：

2024 35TH ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, ASMC | 2024年

关键词：

D O I：

10.1109/ASMC61125.2024.10545372

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In-line metrology provides critical information for feedback and feedforward process control. In high-volume manufacturing, the fundamental question is: how fast, how frequent, and how accurate measurements should be made to satisfy control requirements. This paper develops a framework to study the tradeoff among the sampling rate, the delay, and the quality of measurements and the effect of these canonical factors on the variability of processes. As a consequence of this fundamental tradeoff, the relative value of virtual metrology with respect to real metrology can be quantified in the context of advanced process control.

引用

页数：4

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