Molybdenum Disulfide Memristors for Next Generation Memory and Neuromorphic Computing: Progress and Prospects

被引:3
|
作者
Wells, R. A. [1 ]
Robertson, A. W. [1 ]
机构
[1] Univ Warwick, Dept Phys, Coventry CV4 7AL, England
来源
ADVANCED ELECTRONIC MATERIALS | 2024年 / 10卷 / 10期
关键词
2D materials; memristor; molybdenum disulfide; SINGLE-LAYER; RESISTANCE; MOS2; MECHANISMS; FILAMENTS; SWITCHES; BEHAVIOR; DEVICES; FILMS;
D O I
10.1002/aelm.202400121
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In the last 15 years memristors have been investigated as devices for high-density, low-power, non-volatile, resistive random access memory (ReRAM) beyond Moore's law. They also show potential in neuromorphic logic architectures to overcome the Von-Neumann bottleneck of classical circuitry facilitating better hardware for artificial intelligence (AI) and artificial neural network (ANN) systems. Molybdenum disulfide (MoS2) has emerged as a promising material for memristor devices of monolayer thickness due to its direct bandgap, high carrier mobility and environmental stability. In this review, recent progress in the development of MoS2 memristors the current understanding of the mechanisms behind their function are examined. The remaining obstacles to a commercially viable device principle and how these may be surmounted in light of the rapid progress that has already been made are also discussed. Memristors are a major area of next-generation memory research, offering low-power, non-volatile, and high-speed devices. This review covers recent progress in harnessing the 2D material MoS2 in such devices, and explores the understanding of the atomic-level mechanisms that govern the memristive switching behavior. The remaining obstacles to exploiting MoS2 in memristors and how these inform future research directions are discussed. image
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页数:15
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