Study of Nano-crystalline Silicon Films

被引：0
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作者：
何宇亮
刘湘娜
王志超
程光煦
王路春
于是东
机构：
[1] Department of Physics Nanjing University Nanjing PRC
[2] Department of Physics Nanjing University Nanjing PRC
[3] Laboratory of Solid State Microstructures Nanjing University Nanjing PRC
[4] Laboratory of Solid State Microstructures Nanjing University Nanjing
来源：
ScienceinChina,Ser.A. | 1993年 / Ser.A.1993卷 / 02期
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摘要：
<正> By using strong hydrogen dilution of silane in PECVD system and controlling the deposition parameters strictly, we have prepared a-Si:H and nc-Si:H as well as μc-Si:H films respectively. The structural characters of nc-Si: H films detected by means of HREM, Raman and X-ray diffraction spectra are identified as coinciding with the known definition of nanometer solids. The unique electrical and optical properties of nc-Si:H films are considered as the consequence of its novel structures.
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页数：9
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