Structure and Properties of Cr Films Deposited by High Power Impulse Magnetron Sputtering on Inner Surface of Tube

被引:0
|
作者
Wu H. [1 ]
Tian X. [1 ]
Zheng L. [1 ]
Gong C. [1 ]
Zhang H. [1 ]
机构
[1] State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin
基金
中国国家自然科学基金;
关键词
Cr film; high power impulse magnetron sputtering; inner surface of tube; mechanical property; microstructure;
D O I
10.11933/j.issn.1007-9289.20211208002
中图分类号
学科分类号
摘要
Due to the limitation of lumen space, the uniformity and quality of films deposited on inner surface of tube by physical vapor deposition need to be studied and improved. Cr films are deposited by high power impulse magnetron sputtering on the inner surface of 20 # carbon steel tube with diameter of 40 mm and length of 120 mm. And the microstructure and mechanical properties of Cr films deposited at different positions in the tube are studied. The cross-sectional morphology and thickness changes of Cr films are analyzed by SEM. The crystalline phase and the grain size of Cr films are analyzed by XRD. The friction factors of Cr films are evaluated on ball-on-disc wear apparatus. The results show that, with the increase of the depth in the tube, the film thickness with the distance of 15 mm (Position 1), 45 mm (Position 2), 75 mm (Position 3) and 105 mm (Position 4) from the tube orifice is 1 690 nm, 827 nm, 210 nm and 0 nm respectively. With the increase of the depth in the tube, from Position 1 to Position 3, the surface roughness of the Cr films decreases from 12.6 nm to 4.8 nm, the grain size of the Cr films increases from 15 nm to 38nm, and the friction factor of the Cr films increase from 0.68 to 0.89. © 2022 Chinese Mechanical Engineering Society. All rights reserved.
引用
收藏
页码:210 / 216
页数:6
相关论文
共 23 条
  • [11] TIAN Xiubo, WU Zhongzhen, SHI Jingwei, Et al., Development and discharge behavior of high power density pulse magnetron sputtering system[J], Vacuum, 47, 3, pp. 44-47, (2010)
  • [12] BURTON A W, ONG K, REA T, Et al., On the estimation of average crystallite size of zeolites from the Scherrer equation:A critical evaluation of its application to zeolites with one-dimensional pore systems, Microporous and Mesoporous Materials, 117, pp. 75-90, (2009)
  • [13] WU Z Z, XIAO S, MA Z Y, Et al., Dynamic transition in the discharge current between gas-dominant discharge and self-sputtering in high-power impulse magnetron sputtering, Surface & Coatings Technology, 306, pp. 319-322, (2016)
  • [14] ANDERS A., Discharge physics of high power impulse magnetron sputtering, Surface & Coatings Technology, 205, pp. S1-S9, (2011)
  • [15] FERREC A, KERAUDY J, JACQ S, Et al., Correlation between mass-spectrometer measurements and thin film characteristics using dcMS and HiPIMS discharges, Surface and Coatings Technology, 250, pp. 52-56, (2014)
  • [16] OLIVEIRA J C, FERNANDES F, SERRA R, Et al., On the role of the energetic species in TiN thin film growth by reactive deep oscillation magnetron sputtering in Ar / N<sub>2</sub>, Thin Solid Films, 645, pp. 253-264, (2018)
  • [17] KATHERINE D D, MASANOBU K, MASASHI M, Et al., Effect of deposition rate on the surface morphology of CeO<sub>2</sub> films deposited by pulsed laser deposition, Physica C, 320, pp. 21-30, (1999)
  • [18] VELICU I L, IANOS G T, POROSNICU C, Et al., Energy-enhanced deposition of copper thin films by bipolar high power impulse magnetron sputtering, Surface & Coatings Technology, 359, pp. 97-107, (2019)
  • [19] LIN J L, MOORE J J, SPROUL W D, Et al., The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering, Surface & Coatings Technology, 204, pp. 2230-2239, (2010)
  • [20] FERREIRA F, SERRA R, OLIVEIRA J C, Et al., Effect of peak target power on the properties of Cr thin films sputtered by HiPIMS in deep oscillation magnetron sputtering (DOMS) mode, Surface & Coatings Technology, 258, pp. 249-256, (2014)