A novel strategy for GaN-on-diamond device with a high thermal boundary conductance

被引:0
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作者
Mu, Fengwen [1 ]
Xu, Bin [2 ]
Wang, Xinhua [1 ,3 ,4 ]
Gao, Runhua [1 ]
Huang, Sen [1 ,3 ,4 ]
Wei, Ke [1 ]
Takeuchi, Kai [5 ]
Chen, Xiaojuan [1 ]
Yin, Haibo [1 ]
Wang, Dahai [1 ]
Yu, Jiahan [6 ]
Suga, Tadatomo [5 ]
Shiomi, Junichiro [2 ]
Liu, Xinyu [1 ,3 ,4 ]
机构
[1] High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing,100029, China
[2] Department of Mechanical Engineering, The University of Tokyo, Bunkyo, Tokyo,113–8656, Japan
[3] University of Chinese Academy of Sciences, Beijing,100049, China
[4] Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing,100029, China
[5] Collaborative Research Center, Meisei University, Hino-shi, Tokyo,191–8506, Japan
[6] Integrated Circuit Advanced Process R&D Center, Institute of Microelectronics of Chinese Academy of Sciences, Beijing,100029, China
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