Fast Mask Optimization Method for Extreme Ultraviolet Lithography

被引：0
|
作者：
Zhang, Zinan [1 ,2 ]
Li, Sikun [1 ,2 ]
Wang, Xiangzhao [1 ,2 ]
Cheng, Wei [1 ,2 ]
机构：
[1] Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai,201800, China
[2] Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing,100049, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 2022年 / 42卷 / 13期
关键词：
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摘要：
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