Numerical study of the plasma meniscus shape and beam optics in RF negative ion sources

被引:0
|
作者
Hayashi, K. [1 ]
Hoshino, K. [1 ]
Miyamoto, K. [2 ]
Hatayama, A. [1 ]
Lettry, J. [3 ]
机构
[1] Keio Univ, Fac Sci & Technol, 3-14-1 Hiyoshi,Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
[2] Naruto Univ Educ, Grad Sch Educ, Naruto, Japan
[3] CERN, Geneva, Switzerland
关键词
Ion sources (positive ions; negative ions; electron cyclotron resonance (ECR); electron beam (EBIS)); Accelerator modelling and simulations (multi-particle dynamics; single-particle dynamics); Beam dynamics; Beam Optics;
D O I
10.1088/1748-0221/19/04/C04031
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In order to extract intense ion beams with good beam optics from hydrogen negative ion sources, it is important to control the shape of the plasma meniscus (i.e. beam emission surface). Recently, it is suggested experimentally that the degradation of beam optics in the RF negative ion sources may be due to the fluctuation of the distance d(eff) between the meniscus and the extraction grid caused by the fluctuation of the plasma density n(p). The purpose of this study is to make clear the dependence of d(eff) on n(p) in the presence of a large amount of surface produced H- ions in order to understand such fluctuation of beam optics in RF sources For the purpose, 3D electrostatic PIC simulation was conducted taking the bulk plasma density as a parameter, investigating the extraction region of a H- ion source. A large amount of the surface H- production on the PG has been taken into account under the assumption that the H- production rate is proportional to the bulk plasma density. The result shows that the effective distance d(eff) is proportional to n(p)(-1/2) even for a large amount of surface H- production. This dependence suggests that the bulk plasma density np is the key parameters to control d(eff) and the resultant beam optics extracted from the negative ion source.
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页数:11
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