Study of the mechanism of single event burnout in lateral depletion-mode Ga2O3 MOSFET devices via TCAD simulation

被引:2
|
作者
Wang, Kejia [1 ]
Wang, Zujun [2 ]
Cao, Rongxing [3 ,4 ]
Liu, Hanxun [3 ]
Chang, Wenjing [1 ]
Zhao, Lin [5 ]
Mei, Bo [6 ]
Lv, He [6 ]
Zeng, Xianghua [1 ]
Xue, Yuxiong [3 ,4 ]
机构
[1] Yangzhou Univ, Coll Phys Sci & Technol, Yangzhou 225002, Peoples R China
[2] Northwest Inst Nucl Technol, State Key Lab Intense Pulse Radiat Simulat & Effec, Xian 710024, Peoples R China
[3] Yangzhou Univ, Coll Elect Energy & Power Engn, Yangzhou 225127, Peoples R China
[4] Innovat Ctr Radiat Applicat, Beijing 102413, Peoples R China
[5] Harbin Inst Technol, Inst Special Environm Phys Sci, Shenzhen 518055, Peoples R China
[6] China Acad Space Technol, Beijing 100029, Peoples R China
基金
中国国家自然科学基金;
关键词
HEAVY-ION IRRADIATION; GALLIUM OXIDE;
D O I
10.1063/5.0184704
中图分类号
O59 [应用物理学];
学科分类号
摘要
This study investigates the sensitive region and safe operation voltage of single-event burnout (SEB) in lateral depletion-mode Ga2O3 MOSFET devices via technology computer aided design simulation. Based on the distribution of the electric field, carrier concentration, and electron current density when SEB occurs, the radiation damage mechanism of SEB is proposed. The mechanism of SEB in Ga2O3 MOSFET was revealed to be the result of a unique structure without a PN junction within it, which possesses gate control ability and exerts a significant influence on the conduction of the depletion region. (c) 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Hydrogen-terminated single crystal diamond MOSFET with the dielectric of Ga2O3
    Wang, Yan-Feng
    Wang, Wei
    Zhang, Ming-Hui
    Shao, Guo-Qing
    Zhao, Xi-Xiang
    Wang, Hong-Xing
    JOURNAL OF APPLIED PHYSICS, 2025, 137 (01)
  • [42] Study of photoresponsivity in optoelectronic devices based on single crystal β-Ga2O3 epitaxial layers
    Horng, Ray-Hua
    Ravadgar, Parvaneh
    OXIDE-BASED MATERIALS AND DEVICES IV, 2013, 8626
  • [43] Scintillation and radioluminescence mechanism in β-Ga2O3 semiconducting single crystals
    Wojtowicz, A. J.
    Witkowski, M. E.
    Drozdowski, W.
    Makowski, M.
    Galazka, Z.
    HELIYON, 2023, 9 (11)
  • [44] Proposal and Simulation of Ga2O3 MOSFET With PN Heterojunction Structure for High-Performance E-Mode Operation
    Lei, Weina
    Dang, Kui
    Zhou, Hong
    Zhang, Jincheng
    Wang, Chenlu
    Xin, Qian
    Alghamdi, Sami
    Liu, Zhihong
    Feng, Qian
    Sun, Rujun
    Zhang, Chunfu
    Hao, Yue
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2022, 69 (07) : 3617 - 3622
  • [45] Theoretical Power Figure-of-Merit in β-Ga2O3 Lateral Power Transistors Determined Using Physics-Based TCAD Simulation
    Ahmed, Shaikh S.
    Islam, Ahmad E.
    Dryden, Daniel M.
    Liddy, Kyle J.
    Hendricks, Nolan S.
    Moser, Neil A.
    Chabak, Kelson D.
    Green, Andrew J.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (09) : 5305 - 5312
  • [46] Recent progresses in thermal treatment of β-Ga2O3 single crystals and devices
    Yan, Yuchao
    Jin, Zhu
    Zhang, Hui
    Yang, Deren
    INTERNATIONAL JOURNAL OF MINERALS METALLURGY AND MATERIALS, 2024, 31 (07) : 1659 - 1677
  • [47] Recent progresses in thermal treatment of β-Ga2O3 single crystals and devices
    Yuchao Yan
    Zhu Jin
    Hui Zhang
    Deren Yang
    International Journal of Minerals,Metallurgy and Materials, 2024, (07) : 1659 - 1677
  • [48] Study on nitridation processes of β-Ga2O3 single crystal
    Xing Li
    Xia, Changtai
    He, Xiaoli
    Pei, Guangqing
    Zhang, Jungang
    Jun Xu
    CHINESE OPTICS LETTERS, 2008, 6 (04) : 282 - 285
  • [49] Study on nitridation processes of β-Ga2O3 single crystal
    李星
    夏长泰
    何肖丽
    裴广庆
    张俊刚
    徐军
    ChineseOpticsLetters, 2008, (04) : 282 - 285
  • [50] Ga2O3(Gd2O3) film as high-k gate dielectric for SiGe MOSFET devices
    Pal, S
    Ray, SK
    Lahiri, S
    Bose, DN
    ELECTRONICS LETTERS, 2000, 36 (24) : 2044 - 2046