Chemical vapor deposition of graphene and its characterizations and applications

被引:2
|
作者
Nam, Jungtae [1 ,2 ]
Yang, Jing [3 ,4 ]
Zhao, Yue [3 ,4 ]
Kim, Keun Soo [1 ,2 ]
机构
[1] Sejong Univ, Dept Phys, Seoul 05006, South Korea
[2] Sejong Univ, Graphene Res Inst, Seoul 05006, South Korea
[3] Southern Univ Sci & Technol, Shenzhen Inst Quantum Sci & Engn, Shenzhen 518055, Peoples R China
[4] Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
基金
新加坡国家研究基金会;
关键词
Chemical vapor deposition; Graphene; Nanomaterials; Doping; Characterizations; FEW-LAYER GRAPHENE; GRAIN-BOUNDARIES; ELECTRONIC-PROPERTIES; GROWTH; PERFORMANCE; TRANSPORT; FILMS; SUBSTRATE; DOPANTS;
D O I
10.1016/j.cap.2024.02.010
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Chemical vapor deposition (CVD) plays a crucial role in reactions at the atomic and molecular levels, facilitating the growth of thin material layers and synthesizing various nano-electronic materials. This review focuses primarily on graphene as a representative example. The control of graphene properties is a significant and appealing aspect of graphene research. Graphene can be derived from natural graphite or artificially synthesized, with the latter offering relatively easier access and more straightforward property manipulation. This review delves into the intricate effects of doping and grain boundaries on CVD graphene properties, emphasizing modifications in atomic and electronic structures induced by nitrogen and boron dopants. In the case of single crystal CVD graphene, we have reviewed the transport properties of graphene devices, highlighting their extraordinarily high electronic quality comparable to exfoliated counterparts. In addition, in the final section, we briefly explore some representative application cases leveraging the unique advantages of large-area graphene.
引用
收藏
页码:55 / 70
页数:16
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