An analytical model to predict diffusion induced intermetallic compounds growth in Cu-Sn-Cu sandwich structures

被引:0
|
作者
Yuexing Wang [1 ]
Yao Yao [2 ]
Leon Keer [3 ]
机构
[1] Institute of Electronic Engineering, China Academy of Engineering Physics
[2] School of Mechanics, Civil Engineering and Architecture, Northwestern Polytechnical University
[3] Department of Civil and Environmental Engineering, Northwestern University
基金
中国国家自然科学基金; 中央高校基本科研业务费专项资金资助;
关键词
Intermetallic compounds; Polarity effect; Electromigration; Diffusion; Size effect;
D O I
暂无
中图分类号
TG42 [焊接材料];
学科分类号
摘要
A mass diffusion model is developed to describe the growth kinetics of Cu6Sn5intermetallic compounds(IMC) in the Cu-Sn-Cu sandwich structure. The proposed model is based on the local interfacial mass conversation law where interfacial Cu/Sn reactions and atomic diffusion are considered. Theoretical analysis shows that the IMC thickness growth is proportional to the square root of the product of the diffusion coefficient and time. The proposed model can explain the polarity effect of electromigration on kinetics of IMC growth where all the parameters have clear physical meaning. The theoretical predictions are compared with experimental results and show reasonable accuracy.
引用
收藏
页码:33 / 37
页数:5
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