Epitaxy of Ⅲ-nitrides on two-dimensional materials and its applications

被引:0
|
作者
徐俞 [1 ,2 ]
王建峰 [1 ,2 ]
曹冰 [3 ,4 ]
徐科 [1 ,2 ,5 ]
机构
[1] Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS)
[2] Shenyang National Laboratory for Materials Science
[3] School of Optoelectronic Science and Engineering & Collaborative Innovation Center of Suzhou Nano Science and Technology,Soochow University
[4] Key Laboratory of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Laboratory of Modern Optical Technologies of Education Ministry of China, Soochow University
[5] Jiangsu Institute of Advanced Semiconductors Ltd
基金
中国国家自然科学基金;
关键词
D O I
暂无
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Ⅲ-nitride semiconductor materials have excellent optoelectronic properties, mechanical properties, and chemical stability, which have important applications in the field of optoelectronics and microelectronics. Two-dimensional(2D)materials have been widely focused in recent years due to their peculiar properties. With the property of weak bonding between layers of 2D materials, the growth of Ⅲ-nitrides on 2D materials has been proposed to solve the mismatch problem caused by heterogeneous epitaxy and to develop substrate stripping techniques to obtain high-quality, low-cost nitride materials for high-quality nitride devices and their extension in the field of flexible devices. In this progress report, the main methods for the preparation of 2D materials, and the recent progress and applications of different techniques for the growth of Ⅲ-nitrides based on 2D materials are reviewed.
引用
收藏
页码:36 / 48
页数:13
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