Biaxial versus uniaxial strain tuning of single-layer MoS2

被引:0
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作者
Felix Carrascoso [1 ]
Riccardo Frisenda [1 ]
Andres Castellanos-Gomez [1 ]
机构
[1] Materials Science Factory,Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC)
基金
欧洲研究理事会;
关键词
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暂无
中图分类号
TQ136.12 [];
学科分类号
0817 ;
摘要
Strain engineering has arisen as a powerful technique to tune the electronic and optical properties of two-dimensional semiconductors like molybdenum disulfide(MoS). Although several theoretical works predicted that biaxial strain would be more effective than uniaxial strain to tune the band structure of MoS, a direct experimental verification is still missing in the literature. Here we implemented a simple experimental setup that allows to apply biaxial strain through the bending of a cruciform polymer substrate. We used the setup to study the effect of biaxial strain on the differential reflectance spectra of 12 single-layer MoSflakes finding a redshift of the excitonic features at a rate between-40 me V/% and-110 me V/% of biaxial tension. We also directly compare the effect of biaxial and uniaxial strain on the same single-layer MoSfinding that the biaxial strain gauge factor is 2.3 times larger than the uniaxial strain one.
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页码:44 / 51
页数:8
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