ULTRA-HIGH QUALITY NB/ALOX/NB TUNNEL-JUNCTIONS WITH EPITAXIAL BASE LAYERS

被引:13
|
作者
KIRK, ECG [1 ]
BLAMIRE, MG [1 ]
SOMEKH, RE [1 ]
EVETTS, JE [1 ]
VANVECHTEN, D [1 ]
LOVELLETTE, MN [1 ]
机构
[1] USN,RES LAB,WASHINGTON,DC 20375
关键词
D O I
10.1109/20.133876
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Using an ultra-high vacuum DC sputtering system we have fabricated Nb/AlO(x)/Nb tunnel junction devices with epitaxial Nb base layers. We have been investigating the improvements in device quality which can be achieved by heating the substrates during the growth of the tunnel barrier. By measuring the subgap characteristic under magnetic field at temperatures down to 0.4K, we show that for V < DELTA-Nb the currents in devices with critical current densities in the range 10(5)-10(6)Am-2 follow closely the BCS prediction and show no extrinsic leakage current. The divergence of the curve for higher current densities and at higher voltages is discussed.
引用
收藏
页码:3137 / 3140
页数:4
相关论文
共 50 条
  • [41] Properties of superconducting Nb/Al/Nb/Al-AlOx-Al-AlOx-Al/Nb/Al/Nb tunnel junctions
    Nevirkovets, IP
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1996, 46 : 647 - 648
  • [42] NbN/Nb/AlOx/Nb/NbN junctions fabricated using an ultra-high vacuum dc-magnetron sputtering system
    Nakamura, K
    Akaike, H
    Ninomiya, Y
    Tate, Y
    Fujimaki, A
    Hayakawa, H
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2001, 14 (12): : 1144 - 1147
  • [43] NB-NB THIN-FILM JOSEPHSON TUNNEL-JUNCTIONS
    HAWKINS, G
    CLARKE, J
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1975, 20 (03): : 332 - 332
  • [44] ELECTRICAL CHARACTERIZATION OF NB NB OXIDE PBAUIN JOSEPHSON TUNNEL-JUNCTIONS
    GALLAGHER, WJ
    RAIDER, SI
    DRAKE, RE
    IEEE TRANSACTIONS ON MAGNETICS, 1983, 19 (03) : 807 - 810
  • [45] PREPARATION AND CHARACTERISTICS OF NB/AL-OXIDE-NB TUNNEL-JUNCTIONS
    HUGGINS, HA
    GURVITCH, M
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) : 2103 - 2109
  • [46] FABRICATION OF NB/AL,ALOX/AL/NB JOSEPHSON TUNNEL-JUNCTIONS USING REACTIVE ION ETCHING IN SF6
    ADELERHOF, DJ
    BIJLSMA, ME
    FRANSEN, PBM
    WEIMAN, T
    FLOKSTRA, J
    ROGALLA, H
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 1993, 209 (04): : 477 - 485
  • [47] Fabrication of High Quality Nb/AlOx-Al/Nb Josephson Junctions: II-Deposition of Thin Al Layers on Nb Films
    Imamura, Takeshi
    Hasuo, Shinya
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 1992, 2 (02) : 84 - 94
  • [48] Epitaxial base layer Nb superconducting tunnel junctions with Ta absorbers
    Porter, FS
    VanVechten, D
    Blamire, MG
    Burnell, G
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1996, 370 (01): : 50 - 52
  • [49] Epitaxial base layer Nb superconducting tunnel junctions with Ta absorbers
    Porter, F. Scott
    Van, Vechten, Deborah
    Blamire, Mark G.
    Burnell, Gavin
    Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1996, 370 (01): : 50 - 52
  • [50] FABRICATION OF SUBMICRON NB/ALOX-AL/NB TUNNEL-JUNCTIONS USING FOCUSED ION-BEAM IMPLANTED NB PATTERNING (FINP) TECHNIQUE
    AKAIKE, H
    WATANABE, T
    NAGAI, N
    FUJIMAKI, A
    HAYAKAWA, H
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 1995, 5 (02) : 2310 - 2313