MANUFACTURE OF AMORPHOUS-CARBON LAYERS BY RF DENSE-PLASMA CVD

被引：27

作者：

MITURA, S

MITURA, E

MITURA, A

机构：

[1] TECH UNIV LODZ,FAC PROC & ENVIRONM ENGN,PL-90924 LODZ,POLAND

[2] TECH UNIV LODZ,FAC PHSY & APPL MATH,PL-90924 LODZ,POLAND

来源：

关键词：

AMORPHOUS CARBON; RF PLASMA CVD; GAS PHASE REACTORS; APPLICATIONS;

D O I：

10.1016/0925-9635(94)05203-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The results of experimental studies on the manufacture of amorphous carbon layers by a new method of r.f. dense plasma CVD are presented. The idea of this method is to excite a plasma in methane or other hydrocarbons in an r.f. electric field at a relatively high gas pressure of about 50-400 Pa. The Vickers hardness of the amorphous diamond layers obtained was about 9000 VHN. Amorphous diamond coatings produced by the r.f. dense CH4 plasma method on AISI 316L steel used in surgery were investigated to determine their suitability as biomaterials.

引用

页码：302 / 303

页数：2

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