SIMULATION AND OPTIMIZATION OF PHASE-SHIFT MASKS FOR PRINTING OF CONTACT HOLES

被引：0
|
作者：
PELKA, J
HENKE, W
机构：
[1] Fraunhofer-Institut für Siliziumtechnologie (FhG-ISit), Berlin, D-14199 Berlin
来源：
MICROELECTRONIC ENGINEERING | 1994年 / 26卷 / 01期
关键词：
D O I：
10.1016/0167-9317(94)90041-8
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Using the simulation program solid, comprehensive simulation studies were conducted on the use of phase-shift masks for contact holes in optical lithography. Emphasis was laid on the use of rim-type and outrigger masks. Based on simulation findings, advantages and disadvantages of this technology will be discussed, and aids for design and optimization of phase-shifting mask areas will be given.
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页码：1 / 26
页数：26
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