TA-AL-N THIN-FILM RESISTORS WITH IMPROVED ELECTRICAL-PROPERTIES

被引:10
|
作者
REDDY, PK
BHAGAVAT, GK
JAWALEKAR, SR
机构
关键词
D O I
10.1016/0040-6090(80)90408-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:27 / 35
页数:9
相关论文
共 50 条
  • [1] STRUCTURAL AND ELECTRICAL-PROPERTIES OF CRSI2 THIN-FILM RESISTORS
    HIEBER, K
    DITTMANN, R
    [J]. THIN SOLID FILMS, 1976, 36 (02) : 357 - 360
  • [2] ELECTRICAL-PROPERTIES OF RF SPUTTERED NICR THIN-FILM RESISTORS WITH CU CONTACTS
    NAHAR, RK
    DEVASHRAYEE, NM
    [J]. ELECTROCOMPONENT SCIENCE AND TECHNOLOGY, 1983, 11 (01): : 43 - 51
  • [3] ELECTRICAL-PROPERTIES OF PLANAR THIN-FILM VARICONDS
    VERBITSKAYA, TN
    SOKOLOVA, LS
    [J]. FERROELECTRICS, 1978, 22 (1-2) : 795 - 797
  • [4] THE ELECTRICAL-PROPERTIES OF CERIUM SULFIDE THIN-FILM
    ADACHI, G
    IMANAKA, N
    MATSUBAYASHI, S
    SHIOKAWA, J
    [J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 1985, 4 (02) : 192 - 194
  • [5] ELECTRICAL-PROPERTIES OF MERCURY TELLURIDE THIN-FILM
    TAWFIK, A
    ELATI, MIA
    [J]. INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 1985, 23 (11) : 561 - 563
  • [6] ELECTRICAL-PROPERTIES OF AL-CEO2-AL THIN-FILM CAPACITOR STRUCTURES
    SHEKAR, MC
    BABU, VH
    [J]. CRYSTAL RESEARCH AND TECHNOLOGY, 1984, 19 (09) : 1251 - 1257
  • [7] Structure, electrical, and optical properties of reactively sputter-deposited Ta-Al-N thin films
    Angay, Firat
    Camelio, Sophie
    Eyidi, Dominique
    Krause, Baerbel
    Abadias, Gregory
    [J]. JOURNAL OF APPLIED PHYSICS, 2022, 131 (10)
  • [8] Electrical properties of thin-film resistors in a wide temperature range
    Winiarski, Pawel
    Klossowicz, Adam
    Wroblewski, Jacek
    Dziedzic, Andrzej
    Steplewski, Wojciech
    [J]. CIRCUIT WORLD, 2015, 41 (03) : 116 - 120
  • [9] Fabrication of Ta-Al-N Thin Films and Its Cu Diffusion on Barrier Properties
    Li Youzhen
    Zhou Jicheng
    [J]. ADVANCED MATERIALS AND PROCESSING, 2007, 26-28 : 593 - +
  • [10] Annealing effects on microstructure and properties of Ta-Al thin film resistors
    Chung, C. K.
    Chang, Y. L.
    Chen, T. S.
    Su, P. J.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2006, 201 (07): : 4195 - 4200