MULTIPURPOSE MICROWAVE PLASMA SOURCE

被引：0
|
作者：
CAMPS, E
OLEA, O
ANGUIANO, G
ONDARZA, R
GUTIERREZ, CR
机构：
来源：
REVISTA MEXICANA DE FISICA | 1993年 / 39卷 / 02期
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D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Electron ciclotron resonance (ECR) plasma devices have an important place among the electrodeless cold plasma sources, due to their potential applications in industry. Many different devices of this type are now under research around the world. This paper deals with the design description of a microwave ECR plasma source, in which an overdense plasma will be generated, making use of the plasma eigen modes to induce wave conversion.
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页码：260 / 270
页数：11
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