ACID-CATALYZED DEPROTECTION AND REARRANGEMENT IN RESIST DESIGN

被引：0
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作者：
ITO, H [1 ]
UEDA, M [1 ]
ENGLAND, WP [1 ]
机构：
[1] IBM CORP,DIV RES,ALMADEN RES CTR,SAN JOSE,CA 95120
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1989年 / 198卷
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
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页码：14 / PMSE
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