ENERGY AND FLUENCE DEPENDENCE OF THE SPUTTERING YIELD OF SILICON BOMBARDED WITH ARGON AND XENON

被引：89
|
作者：
BLANK, P [1 ]
WITTMAACK, K [1 ]
机构：
[1] GESELLS STRAHLEN & UMWELTFORSCH MBH,PHYS TECH ABT,D-8042 NEUHERBERG,FED REP GER
来源：
JOURNAL OF APPLIED PHYSICS | 1979年 / 50卷 / 03期
关键词：
D O I：
10.1063/1.326140
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1519 / 1528
页数：10
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