INVESTIGATION OF SINGLE SIDE-BAND OPTICAL LITHOGRAPHY USING OBLIQUE-INCIDENCE ILLUMINATION

被引：8
|
作者：
TAMECHIKA, E
MATSUO, S
KOMATSU, K
TAKEUCHI, Y
MIMURA, Y
HARADA, K
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期
关键词：
D O I：
10.1116/1.585965
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We propose a new method for enhancing the image contrast in oblique illumination lithography. In this article, we analyze the modulation transfer function to clarify the cause of poor contrast in oblique illumination systems. A unique optimization procedure is also proposed. It is carried out for the oblique illumination systems, including single sideband optical lithography. It is found that the contrast enhancing method and optimization can improve the resolution for annular source and four-point-type sources. These improvements open up the possibility of 0.25-mum resolution with i-line lithography.
引用
收藏
页码：3027 / 3031
页数：5
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