AN INSITU DIFFUSE REFLECTANCE FTIR INVESTIGATION OF PHOTOCATALYTIC DEGRADATION OF 4-CHLOROPHENOL ON A TIO2 POWDER SURFACE

被引：157

作者：

STAFFORD, U ^{[1
]}

GRAY, KA ^{[1
]}

KAMAT, PV ^{[1
]}

VARMA, A ^{[1
]}

机构：

[1] UNIV NOTRE DAME, NOTRE DAME RADIAT LAB, NOTRE DAME, IN 46556 USA

来源：

CHEMICAL PHYSICS LETTERS | 1993年 / 205卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0009-2614(93)85166-L

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An in situ FTIR technique has been employed to probe the adsorption and photocatalytic degradation of 4-chlorophenol (4-CP) on TiO2 particles in a gas/solid system. The chemisorbed 4-CP adsorbed on the TiO2 surface corresponds to a monolayer. The reaction has been followed under a number of conditions in order to investigate the roles of oxygen and water in the mechanism of 4-CP degradation. The rate of 4-CP disappearance was greatest under an oxygen atmosphere saturated with water and with UV irradiation. Under these conditions hydroquinone (HQ) was observed as a primary reaction inter-mediate and carbonates as the final product. Transformation of 4-CP to HQ was seen to occur under a variety of reaction conditions (i.e. O2/UV, N2/H2O/UV), but HQ degradation took place only in the presence of oxygen and UV irradiation. These results illustrate that the interactions of 4-CP at the semiconductor surface are complex and suggest that oxygen is intrinsically involved in the degradation reactions.

引用

页码：55 / 61

页数：7

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