ELECTRONIC PROPERTIES OF A CHARACTERISTIC DISCRETE LEVEL AT SI-SIO2 INTERFACE

被引:0
|
作者
JOHNSON, NM [1 ]
BARTELINK, DJ [1 ]
MCVITTIE, JP [1 ]
机构
[1] XEROX CORP,RES CTR,PALO ALTO,CA 94304
关键词
D O I
10.1109/T-ED.1978.19312
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
下载
收藏
页码:1348 / 1349
页数:2
相关论文
共 50 条
  • [21] INDIVIDUAL INTERFACE TRAPS AT THE SI-SIO2 INTERFACE
    MUELLER, HH
    SCHULZ, M
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1994, 5 (06) : 329 - 338
  • [22] INDIVIDUAL INTERFACE TRAPS AT THE SI-SIO2 INTERFACE
    MUELLER, HH
    SCHULZ, M
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1995, 6 (02) : 65 - 74
  • [23] OPTICAL MODELING OF SI-SIO2 INTERFACE
    KALNITSKY, A
    TAY, SP
    ELLUL, JP
    CHOGSAWANGVIROD, S
    IRENE, EA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C362 - C363
  • [24] IMPROVED CHARACTERIZATION OF THE SI-SIO2 INTERFACE
    SU, P
    SHER, A
    TSUO, YH
    MORIARTY, JA
    MILLER, WE
    APPLIED PHYSICS LETTERS, 1980, 36 (12) : 991 - 993
  • [25] Structure and energetics of the Si-SiO2 interface
    Tu, Y
    Tersoff, J
    PHYSICAL REVIEW LETTERS, 2000, 84 (19) : 4393 - 4396
  • [26] CHEMISTRY AND MORPHOLOGY OF THE SI-SIO2 INTERFACE
    HELMS, CR
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1980, 179 (MAR): : 5 - COLL
  • [27] CAPTURE OF HOLES AT THE SI-SIO2 INTERFACE
    BARABAN, AP
    TARANTOV, YA
    BULAVINOV, VV
    KONOROV, PP
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1982, 16 (07): : 825 - 826
  • [28] Precipitation of Fe at the Si-SiO2 interface
    Wong-Leung, J.
    Eaglesham, D.J.
    Sapjeta, J.
    Jacobson, D.C.
    Poate, J.M.
    Williams, J.S.
    Journal of Applied Physics, 1998, 83 (01):
  • [29] INTERFACE STATES IN SI-SIO2 INTERFACES
    DEULING, H
    KLAUSMANN, E
    GOETZBERGER, A
    SOLID-STATE ELECTRONICS, 1972, 15 (05) : 559 - +
  • [30] CARBON IMPURITIES AT A SI-SIO2 INTERFACE
    RAIDER, SI
    MICROELECTRONIC ENGINEERING, 1993, 22 (1-4) : 29 - 34