Nanostructured Ni3Al produced by magnetron sputtering

被引：10
|
作者：
VanSwygenhoven, H
Boni, P
Paschoud, F
Victoria, M
Knauss, M
机构：
[1] EPFL,CRPP,FUS TECHNOL DIV,CH-5232 VILLIGEN,SWITZERLAND
[2] MAX PLANCK INST MET RES,W-7000 STUTTGART,GERMANY
来源：
NANOSTRUCTURED MATERIALS | 1995年 / 6卷 / 5-8期
关键词：
D O I：
10.1016/0965-9773(95)00164-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Intermetallic Ni3Al has been deposited by means of magnetron sputtering on substrates with an amorphous surface structure. The source was a homogeneous mixture of Ni-AI 75:25 % in the solid phase. The lateral and perpendicular grain sizes are below 20 nm. The morphology of the layer was studied by transmission electron microscopy. The hardness of a single Ni3Al layer and of a multilayered Ni3Al/Ni are measured by nanoindentation and compared with the hardness of a bulk coarse-grained polycrystalline Ni3Al.
引用
收藏
页码：739 / 742
页数：4
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