GENERATION OF ELECTROCHEMICALLY DEPOSITED METAL PATTERNS BY MEANS OF ELECTRON-BEAM (NANO)LITHOGRAPHY OF SELF-ASSEMBLED MONOLAYER RESISTS

被引：95
|
作者：
SONDAGHUETHORST, JAM
VANHELLEPUTTE, HRJ
FOKKINK, LGJ
机构：
[1] Philips Research Laboratories, 5600 JA Eindhoven
来源：
APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 03期
关键词：
D O I：
10.1063/1.111182
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Submicron metal patterns have been produced by galvanic deposition in openings in a monolayer resist generated by electron beam (e-beam) lithography. The monolayer resist is a self-assembled docosanethiol (C22H45SH) layer adsorbed on gold. Proper removal of the thiol requires an e-beam dose of 10-100 mC cm-2. The positive resist pattern was used to selectively deposit galvanic copper. The size of the Cu patterns is affected by the galvanic deposition time and the CuSO4 concentration in the electrolyte solution. The smallest Cu patterns produced were about 75 nm in width.
引用
收藏
页码：285 / 287
页数：3
相关论文
共 50 条
  • [31] Self-assembled monolayer resists and nanoscale lithography of silicon dioxide thin films by chemically enhanced vapor etching (CEVE)
    Pan, M
    Yun, M
    Kozicki, MN
    Whidden, TK
    SUPERLATTICES AND MICROSTRUCTURES, 1996, 20 (03) : 369 - 376
  • [32] Selective atomic layer deposition with electron-beam patterned self-assembled monolayers
    Huang, Jie
    Lee, Mingun
    Kim, Jiyoung
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2012, 30 (01):
  • [33] Electron-beam exposure of self-assembled monolayers of 10-undecenoic acid
    Kozicki, MN
    Yang, SJ
    Axelrod, BW
    SUPERLATTICES AND MICROSTRUCTURES, 2000, 27 (5-6) : 481 - 484
  • [34] Nanoscale patterning of protein using electron beam lithography of organosilane self-assembled monolayers
    Zhang, GJ
    Tanii, T
    Zako, T
    Hosaka, T
    Miyake, T
    Kanari, Y
    Funatsu, TW
    Ohdomari, I
    SMALL, 2005, 1 (8-9) : 833 - 837
  • [35] EFFECTS OF IMPURITIES ON PROCESSES OF ACID GENERATION IN CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM AND X-RAY-LITHOGRAPHY
    KOZAWA, T
    UESAKA, M
    YOSHIDA, Y
    TAGAWA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12B): : 6049 - 6051
  • [36] Analysis of electron beam sensitivity of self-assembled monolayer resist depending on terminal group
    Kato, K.
    Miyake, T.
    Beppu, Y.
    Tanii, T.
    Ohdomari, T.
    MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS, 2007, : 60 - 61
  • [37] Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography
    Yang, Ki-Yeon
    Kim, Jong-Woo
    Byeon, Kyeong-Jae
    Lee, Heon
    MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 1552 - 1555
  • [38] PATTERNING OF SELF-ASSEMBLED ALKANETHIOL MONOLAYERS ON SILVER BY MICROFOCUS ION AND ELECTRON-BEAM BOMBARDMENT
    GILLEN, G
    WIGHT, S
    BENNETT, J
    TARLOV, MJ
    APPLIED PHYSICS LETTERS, 1994, 65 (05) : 534 - 536
  • [39] Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments
    Yamamoto, Hiroki
    Dawson, Guy
    Kozawa, Takahiro
    Robinson, Alex P. G.
    QUANTUM BEAM SCIENCE, 2020, 4 (02)
  • [40] Bioactive templates fabricated by low-energy electron beam lithography of self-assembled monolayers
    Harnett, CK
    Satyalakshmi, KM
    Craighead, HG
    LANGMUIR, 2001, 17 (01) : 178 - 182
12345